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Effect of the Cu capping thickness on the magnetic properties of thin Ni/Cu(001) films

Abstract:: We have studied the effect of the Cu capping thickness (in the range 20 ≤ tcu ≤ 180 Å) on the magnetic and structural properties of ultrathin FCC 40Å Ni/Cu(001) films by means of magneto-optic Kerr effect (MOKE) magnetometry, polarised neutron reflection (PNR) and grazing incidence X-ray surface diffraction (GID) measurements. MOKE measurements show that perpendicular magnetic anisotropy (PMA) is observed for the whole of the Cu thickness range studied, while an increase of the coercive field...
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APA Style

Vaz, C., Lauhoff, G., Bland, J., Fulthorpe, B., Hase, T., Tanner, B., Langridge, S., & Penfold, J. (2001). Effect of the Cu capping thickness on the magnetic properties of thin Ni/Cu(001) films. 226(PART II), 1618–1620.

MLA Style

Vaz, C., et al. Effect of the Cu Capping Thickness on the Magnetic Properties of Thin Ni/Cu(001) Films. no. PART II, 2001, pp. 1618–20.

Chicago Style

Vaz, C, G Lauhoff, J Bland, B Fulthorpe, T Hase, B Tanner, S Langridge, and J Penfold. 2001. “Effect of the Cu Capping Thickness on the Magnetic Properties of Thin Ni/Cu(001) Films.” In , 226:1618–20.
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Publisher copy:: 10.1016/S0304-8853(01)00083-X

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+ Vaz, C More by this author

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+ Lauhoff, G More by this author

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+ Bland, J More by this author

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+ Fulthorpe, B More by this author

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+ Hase, T More by this author

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Bibliographic Details

Host title:: JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
Volume:: 226
Issue:: PART II
Pages:: 1618-1620
Publication date:: 2001-05-01
DOI:: 10.1016/S0304-8853(01)00083-X
ISSN:: 0304-8853

Item Description

Keywords:: stress-internal

neutron reflection-polarised

thin films-epitaxial

X-ray diffraction

magnetic moment saturation
Pubs id:: pubs:121626
UUID:: uuid:bf33bfab-b5ee-48e7-b090-f5e339a8eb3b
Local pid:: pubs:121626
Source identifiers:: 121626
Deposit date:: 2012-12-19

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Copyright date:: 2001

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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