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Atom probe analysis of roughness and chemical intermixing in CoFe/Cu films (invited)

Abstract:

Three-dimensional atom probe analyses of the interfaces between CoFe and Cu layers has shown that both roughness and chemical intermixing can occur independently. Interfaces formed by the deposition of Cu onto CoFe mimic the roughness present in previously deposited interfaces, but have a very small amount of interfacial mixing. In contrast, interfaces formed by the deposition of CoFe onto Cu are less rough, but more chemically intermixed. The region of chemical intermixing formed when CoFe i...

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Publication status:
Published

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Publisher copy:
10.1063/1.1354593

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Institution:
University of Oxford
Department:
Oxford, MPLS, Materials
Role:
Author
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Volume:
89
Issue:
11
Pages:
7517-7521
Publication date:
2001-06-01
DOI:
ISSN:
0021-8979
URN:
uuid:bad2a045-72e3-4917-ae3b-8a3287bc6b17
Source identifiers:
22775
Local pid:
pubs:22775

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