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Atom probe analysis of roughness and chemical intermixing in CoFe/Cu films (invited)

Abstract:

Three-dimensional atom probe analyses of the interfaces between CoFe and Cu layers has shown that both roughness and chemical intermixing can occur independently. Interfaces formed by the deposition of Cu onto CoFe mimic the roughness present in previously deposited interfaces, but have a very small amount of interfacial mixing. In contrast, interfaces formed by the deposition of CoFe onto Cu are less rough, but more chemically intermixed. The region of chemical intermixing formed when CoFe i...

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Publication status:
Published

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Publisher copy:
10.1063/1.1354593

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Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
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Journal:
JOURNAL OF APPLIED PHYSICS
Volume:
89
Issue:
11
Pages:
7517-7521
Publication date:
2001-06-01
Event title:
8th Joint MMM/Intermag Conference
DOI:
ISSN:
0021-8979
Source identifiers:
22775
Keywords:
Pubs id:
pubs:22775
UUID:
uuid:bad2a045-72e3-4917-ae3b-8a3287bc6b17
Local pid:
pubs:22775
Deposit date:
2012-12-19

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