- Abstract:
-
Scanning transmission electron microscopy in high angle annular dark field mode has been used to undertake a characterisation study with sub-nanometric spatial resolution of the barrier formation process for a Cu(Mn) alloy (90%/10%) deposited on SiO2. Electron energy loss spectroscopy (EELS) measurements provide clear evidence for the expulsion of the alloying element to the dielectric interface as a function of thermal annealing where it chemically reacts with the SiO2. Analysis of the Mn L2...
Expand abstract - Publication status:
- Published
- Publisher copy:
- 10.1063/1.4822441
-
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- Publisher:
- American Institute of Physics Inc.
- Journal:
- APL MATERIALS
- Volume:
- 1
- Issue:
- 4
- Pages:
- 042105-042105
- Publication date:
- 2013-10-05
- DOI:
- EISSN:
-
2166-532X
- ISSN:
-
2166-532X
- URN:
-
uuid:b4ea1b26-9a1a-442c-a6a2-33c6796bf956
- Source identifiers:
-
460661
- Local pid:
- pubs:460661
- Language:
- English
- Copyright date:
- 2013
Journal article
Scanning transmission electron microscopy investigations of self-forming diffusion barrier formation in Cu(Mn) alloys on SiO2
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