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Scanning transmission electron microscopy investigations of self-forming diffusion barrier formation in Cu(Mn) alloys on SiO2

Abstract:

Scanning transmission electron microscopy in high angle annular dark field mode has been used to undertake a characterisation study with sub-nanometric spatial resolution of the barrier formation process for a Cu(Mn) alloy (90%/10%) deposited on SiO2. Electron energy loss spectroscopy (EELS) measurements provide clear evidence for the expulsion of the alloying element to the dielectric interface as a function of thermal annealing where it chemically reacts with the SiO2. Analysis of the Mn L2...

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Publication status:
Published

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Publisher copy:
10.1063/1.4822441

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Publisher:
American Institute of Physics Inc.
Journal:
APL MATERIALS
Volume:
1
Issue:
4
Pages:
042105-042105
Publication date:
2013-10-05
DOI:
EISSN:
2166-532X
ISSN:
2166-532X
URN:
uuid:b4ea1b26-9a1a-442c-a6a2-33c6796bf956
Source identifiers:
460661
Local pid:
pubs:460661
Language:
English

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