IMAGING OF SEMICONDUCTOR DEFECTS USING ION CHANNELING - ORA - Oxford University Research Archive

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IMAGING OF SEMICONDUCTOR DEFECTS USING ION CHANNELING

Publication status:: Published

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APA Style

King, P., Breese, M., Wilshaw, P., Booker, G., Grime, C., Watt, F., & Goringe, M. (2016). IMAGING OF SEMICONDUCTOR DEFECTS USING ION CHANNELING. MICROSCOPY OF SEMICONDUCTING MATERIALS 1993, 134, 153–156.

MLA Style

King, P., et al. “IMAGING OF SEMICONDUCTOR DEFECTS USING ION CHANNELING.” MICROSCOPY OF SEMICONDUCTING MATERIALS 1993, no. 134, 2016, pp. 153–56.

Chicago Style

King, P, M Breese, P Wilshaw, G Booker, C Grime, F Watt, and M Goringe. 2016. “IMAGING OF SEMICONDUCTOR DEFECTS USING ION CHANNELING.” In MICROSCOPY OF SEMICONDUCTING MATERIALS 1993, 153–56.
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+ Breese, M More by this author

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+ Wilshaw, P More by this author

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+ Booker, G More by this author

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+ Grime, C More by this author

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Bibliographic Details

Journal:: MICROSCOPY OF SEMICONDUCTING MATERIALS 1993
Issue:: 134
Pages:: 153-156
Publication date:: 1993-01-01
Event title:: 8th Royal-Microscopical-Society Conference: Microscopy of Semiconducting Materials 1993 (MSM VIII)
ISSN:: 0951-3248
Source identifiers:: 23190
ISBN:: 0750302909

Item Description

Keywords:: MICROSCOPY
Pubs id:: pubs:23190
UUID:: uuid:b2f586ad-77ef-410d-978e-4d0c09c18e38
Local pid:: pubs:23190
Deposit date:: 2012-12-19

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Copyright date:: 1993

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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