Stress-assisted thermal diffusion barrier breakdown in ion beam deposited Cu/W nano-multilayers on Si substrate observed by in Situ GISAXS and transmission EDX
The thermal stability of Cu/W nano-multilayers deposited on a Si substrate using ion beam deposition was analyzed in situ by GISAXS and transmission EDX—a combination of methods permitting the observation of diffusion processes within buried layers. Further supporting techniques such as XRR, TEM, WAXS, and AFM were employed to develop an extensive microstructural understanding of the multilayer before and during heating. It was found that the pronounced in-plane compressive residual stress an...Expand abstract
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- Romano Brandt et al.
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