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Stress-assisted thermal diffusion barrier breakdown in ion beam deposited Cu/W nano-multilayers on Si substrate observed by in Situ GISAXS and transmission EDX

Abstract:

The thermal stability of Cu/W nano-multilayers deposited on a Si substrate using ion beam deposition was analyzed in situ by GISAXS and transmission EDX—a combination of methods permitting the observation of diffusion processes within buried layers. Further supporting techniques such as XRR, TEM, WAXS, and AFM were employed to develop an extensive microstructural understanding of the multilayer before and during heating. It was found that the pronounced in-plane compressive residual stress an...

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Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1021/acsami.0c19173

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Role:
Author
ORCID:
0000-0002-4195-9993
Research Councils UK More from this funder
Publisher:
American Chemical Society Publisher's website
Journal:
ACS Applied Materials and Interfaces Journal website
Volume:
13
Issue:
5
Pages:
6795-6804
Publication date:
2021-01-28
Acceptance date:
2021-01-22
DOI:
EISSN:
1944-8252
ISSN:
1944-8244
Pmid:
33507755
Language:
English
Keywords:
Pubs id:
1159244
Local pid:
pubs:1159244
Deposit date:
2022-06-25

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