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Integrating Philips' extreme UV source in the alpha-tools

Abstract:

The paper describes recent progress in the development of the Philips's EUV source. Progress has been realized at many frontiers: Integration studies of the source into a scanner have primarily been studied on the Xe source because it has a high degree of maturity. We report on integration with a collector, associated collector lifetime and optical characteristics. Collector lifetime in excess of 1 bln shots could be demonstrated. Next, an active dose control system was developed and tested o...

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Publication status:
Published

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Publisher copy:
10.1117/12.598650

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Journal:
Emerging Lithographic Technologies IX, Pts 1 and 2
Volume:
5751
Pages:
260-271
Publication date:
2005-01-01
Event title:
Conference on Emerging Lithographic Technologies IX
DOI:
ISSN:
0277-786X
Source identifiers:
10685
ISBN:
0819457310
Keywords:
Pubs id:
pubs:10685
UUID:
uuid:ad5f3121-0aa1-4d7e-b5d6-2774a0b172e8
Local pid:
pubs:10685
Deposit date:
2012-12-19

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