Conference item
Integrating Philips' extreme UV source in the alpha-tools
- Abstract:
-
The paper describes recent progress in the development of the Philips's EUV source. Progress has been realized at many frontiers: Integration studies of the source into a scanner have primarily been studied on the Xe source because it has a high degree of maturity. We report on integration with a collector, associated collector lifetime and optical characteristics. Collector lifetime in excess of 1 bln shots could be demonstrated. Next, an active dose control system was developed and tested o...
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- Publication status:
- Published
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Bibliographic Details
- Journal:
- Emerging Lithographic Technologies IX, Pts 1 and 2
- Volume:
- 5751
- Pages:
- 260-271
- Publication date:
- 2005-01-01
- Event title:
- Conference on Emerging Lithographic Technologies IX
- DOI:
- ISSN:
-
0277-786X
- ISBN:
- 0819457310
Item Description
- Keywords:
- Pubs id:
-
pubs:10685
- UUID:
-
uuid:ad5f3121-0aa1-4d7e-b5d6-2774a0b172e8
- Local pid:
- pubs:10685
- Source identifiers:
-
10685
- Deposit date:
- 2012-12-19
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- Copyright date:
- 2005
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