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Journal article

CHEMICAL VAPOR-DEPOSITION ON SILICON - INSITU SURFACE STUDIES

Publication status:
Published

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Journal:
CHEMICAL PHYSICS LETTERS
Volume:
112
Issue:
2
Pages:
190-194
Publication date:
1984-01-01
DOI:
ISSN:
0009-2614
Source identifiers:
42416
Pubs id:
pubs:42416
UUID:
uuid:ad01ee3c-471c-4065-9910-eaadaf1b1e19
Local pid:
pubs:42416
Deposit date:
2012-12-19

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