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Defect-Free GaAs/AlGaAs Core-Shell Nanowires on Si Substrates

Abstract:

We report straight and vertically aligned defect-free GaAs nanowires grown on Si(111) substrates by metal-organic chemical vapor deposition. By deposition of thin GaAs buffer layers on Si substrates, these nanowires could be grown on the buffer layers with much less stringent conditions as otherwise imposed by epitaxy of III-V compounds on Si. Also, crystal-defect-free GaAs nanowires were grown by using either a two-temperature growth mode consisting of a short initial nucleation step under h...

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Publication status:
Published

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Publisher copy:
10.1021/cg2003657

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Institution:
University of Oxford
Division:
MPLS
Department:
Physics
Role:
Author
Journal:
CRYSTAL GROWTH and DESIGN
Volume:
11
Issue:
7
Pages:
3109-3114
Publication date:
2011-07-01
DOI:
EISSN:
1528-7505
ISSN:
1528-7483
Language:
English
Pubs id:
pubs:166795
UUID:
uuid:a7534ec1-c82f-49c0-b0d4-f126045b5b84
Local pid:
pubs:166795
Source identifiers:
166795
Deposit date:
2012-12-19

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