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Cryogenic two-photon laser photolithography with SU-8

Abstract:

We have shown that photolithography can be used to create alignment markers on a semiconductor substrate at cryogenic temperatures. The epoxy resist SU-8 can be exposed effectively by two-photon absorption at a temperature of 4 K. By this means a spectroscopy apparatus can be used to find the positions of randomly distributed structures at low temperatures, such as InGaAsGaAs quantum dots, and mark their positions. We present a systematic study of the optical exposure parameters for cryogenic...

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Publication status:
Published

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Publisher copy:
10.1063/1.2194311

Authors


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Institution:
University of Oxford
Department:
Oxford, MPLS, Physics, Condensed Matter Physics
Role:
Author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Physics
Role:
Author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Physics, Condensed Matter Physics
Role:
Author
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Journal:
APPLIED PHYSICS LETTERS
Volume:
88
Issue:
14
Pages:
143123-143123
Publication date:
2006-04-03
DOI:
ISSN:
0003-6951
URN:
uuid:7cb179ab-2775-4210-969c-f139a764e330
Source identifiers:
134746
Local pid:
pubs:134746
Language:
English

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