- Abstract:
-
We have shown that photolithography can be used to create alignment markers on a semiconductor substrate at cryogenic temperatures. The epoxy resist SU-8 can be exposed effectively by two-photon absorption at a temperature of 4 K. By this means a spectroscopy apparatus can be used to find the positions of randomly distributed structures at low temperatures, such as InGaAsGaAs quantum dots, and mark their positions. We present a systematic study of the optical exposure parameters for cryogenic...
Expand abstract - Publication status:
- Published
- Publisher copy:
- 10.1063/1.2194311
-
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- Journal:
- APPLIED PHYSICS LETTERS
- Volume:
- 88
- Issue:
- 14
- Pages:
- 143123-143123
- Publication date:
- 2006-04-03
- DOI:
- ISSN:
-
0003-6951
- URN:
-
uuid:7cb179ab-2775-4210-969c-f139a764e330
- Source identifiers:
-
134746
- Local pid:
- pubs:134746
- Language:
- English
- Copyright date:
- 2006
Journal article
Cryogenic two-photon laser photolithography with SU-8
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