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Measurement and modeling of Ar/H2CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities

Abstract:

Comparisons are drawn between spatially resolved absorption spectroscopy data obtained for a 6.4 kW dc arc jet reactor, operating with Ar H2 C H4 gas mixtures, used for deposition of thin, polycrystalline diamond films, and the results of a two-dimensional (r,z) computer model incorporating gas activation, expansion into the low pressure reactor, and the chemistry of the neutral and charged species. The experimental measurements, using either cavity ring-down spectroscopy or diode laser absor...

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Publisher copy:
10.1063/1.2783890

Authors


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Institution:
University of Oxford
Department:
Oxford, MPLS, Chemistry
Henney, JJ More by this author
Ashfold, MNR More by this author
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Journal:
Journal of Applied Physics
Volume:
102
Issue:
6
Pages:
063309-063309
Publication date:
2007
DOI:
ISSN:
0021-8979
URN:
uuid:74d27ae9-06ae-479d-9c27-193ee13642d2
Source identifiers:
288516
Local pid:
pubs:288516
Language:
English

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