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Microstructural and microwave characterisation of low temperature processed Tl2Ba2Ca1Cu2Ox thin films

Abstract:
Tl2Ba2Ca1Cu2Ox thin films on LaAlO3 with excellent alignment suitable for the fabrication of passive microwave devices operating at 77K are fabricated using an ex-situ anneal step in argon atmospheres at temperatures of 720 - 740 degrees C, In order to understand the factors influencing their microwave and transport properties, the microstructure and compositions of the films have been examined by TEM, HREM and SEM and correlated with the R-s measurements obtained by the partial-end-wall-replacement technique.
Publication status:
Published

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Publisher copy:
10.1109/77.620956

Authors


OConnor, JD More by this author
Jenkins, AP More by this author
DewHughes, D More by this author
Goringe, MJ More by this author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Materials
Volume:
7
Issue:
2
Pages:
1899-1902
Publication date:
1997-06-05
DOI:
ISSN:
1051-8223
URN:
uuid:746cea09-316a-47a8-8dcb-a18723ac441a
Source identifiers:
30679
Local pid:
pubs:30679

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