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Hydrogen addition for centimeter-sized monolayer tungsten disulfide continuous films by ambient pressure chemical vapor deposition

Abstract:

Monolayer tungsten disulfide (WS 2 ) offers great prospects for use in optoelectronic devices due to its direct bandgap and high photoluminescence intensity. Here, we show how the controlled addition of hydrogen into the chemical vapor deposition growth of WS 2 can lead to the formation of centimeter scale continuous monolayer films at ambient pressure without the need for seed molecules, specially prepared substrates, or low pressure vacuum systems. Modifications of the reaction conditions,...

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Publication status:
Published
Peer review status:
Peer reviewed

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Publisher copy:
10.1021/acs.chemmater.7b00954

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Department:
Oxford, MPLS, Materials
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Department:
Oxford, MPLS, Materials
More by this author
Department:
Oxford, MPLS, Materials
More by this author
Department:
Oxford, MPLS, Materials
Royal Society More from this funder
Great Britain-China Educational Trust More from this funder
St Cross College, Oxford More from this funder
Publisher:
American Chemical Society Publisher's website
Journal:
Chemistry of Materials Journal website
Volume:
29
Issue:
11
Pages:
4904-4911
Publication date:
2017-05-15
Acceptance date:
2017-05-05
DOI:
EISSN:
1520-5002
ISSN:
0897-4756
Pubs id:
pubs:702559
URN:
uri:737290f6-754c-401e-b0f7-38cfab118b02
UUID:
uuid:737290f6-754c-401e-b0f7-38cfab118b02
Local pid:
pubs:702559
Keywords:

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