Journal article icon

Journal article

Electrodeposition of lead at boron-doped diamond film electrodes: Effect of temperature

Abstract:

The electrodeposition of lead on boron-doped diamond has been studied with a view to identifying the fundamental parameters controlling the sensitivity and lower detection limit in anodic stripping voltammetry. Chronoamperometric transients are used to explore the deposition, indicating a progressive growth mechanism confirmed by ex situ AFM images. Linear sweep ASV experiments show a threshold concentration of ca 10-6 M below which no lead is detected; this is attributed to the need for nucl...

Expand abstract
Publication status:
Published

Actions


Access Document


Publisher copy:
10.1002/elan.200390121

Authors


More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Chemistry
Sub department:
Physical & Theoretical Chem
Role:
Author
Journal:
ELECTROANALYSIS More from this journal
Volume:
15
Issue:
12
Pages:
1011-1016
Publication date:
2003-08-01
DOI:
EISSN:
1521-4109
ISSN:
1040-0397
Language:
English
Keywords:
UUID:
uuid:6c6e0add-9cb3-4746-8db2-f44454fb4202
Local pid:
pubs:38694
Source identifiers:
38694
Deposit date:
2012-12-19

Terms of use


Views and Downloads






If you are the owner of this record, you can report an update to it here: Report update to this record

TO TOP