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Elemental engineering: Epitaxial uranium thin films

Publication status:: Published

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APA Style

Springell, R., Detlefs, B., Lander, G., Ward, R., Cowley, R., Ling, N., Goetze, W., Ahuja, R., Luo, W., & Johansson, B. (2008). Elemental engineering: Epitaxial uranium thin films. Physical Review B, 78(19).

MLA Style

Springell, R., et al. “Elemental Engineering: Epitaxial Uranium Thin Films.” Physical Review B, vol. 78, no. 19, 2008.

Chicago Style

Springell, R, B Detlefs, G Lander, R Ward, R Cowley, N Ling, W Goetze, R Ahuja, W Luo, and B Johansson. 2008. “Elemental Engineering: Epitaxial Uranium Thin Films.” Physical Review B 78 (19).
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Publisher copy:: 10.1103/PhysRevB.78.193403

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+ Springell, R More by this author

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+ Detlefs, B More by this author

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+ Lander, G More by this author

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+ Ward, R More by this author

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+ Cowley, R More by this author

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Bibliographic Details

Journal:: Physical Review B
Volume:: 78
Issue:: 19
Publication date:: 2008-11-01
DOI:: 10.1103/PhysRevB.78.193403
EISSN:: 1550-235X
ISSN:: 1098-0121

Item Description

Keywords:: crystal structure

sputter deposition

buffer layers

uranium

niobium

gadolinium

magnetic epitaxial layers

charge density waves
Pubs id:: pubs:218477
UUID:: uuid:6c112135-0ca1-4de1-ae90-9caeb67dba3e
Local pid:: pubs:218477
Source identifiers:: 218477
Deposit date:: 2014-09-14

Terms of use

Copyright date:: 2008

Licence:: Terms and Conditions of Use for Oxford University Research Archive

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