Journal article
Electron-optical sectioning for three-dimensional imaging of crystal defect structures
- Abstract:
-
The depth of field of an optical imaging system is proportional to the inverse square of the numerical aperture. The development of electron-optical devices to correct for the inherent spherical aberration of electron optics has led to a dramatic increase in numerical aperture that therefore also result in dramatic reductions in depth of field. The depth of field of a state-of-the-art system may now reach below 5 nm. An opportunity is therefore created to measure three-dimensional information...
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- Publication status:
- Published
- Peer review status:
- Peer reviewed
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- Files:
-
-
(Accepted manuscript, pdf, 987.9KB)
-
- Publisher copy:
- 10.1016/j.mssp.2016.09.041
Authors
Funding
+ Engineering and Physical Sciences Research Council
More from this funder
Grant:
EP/F048009/1
EP/K032518/1
Bibliographic Details
- Publisher:
- Elsevier Publisher's website
- Journal:
- Materials Science in Semiconductor Processing Journal website
- Volume:
- 65
- Pages:
- 18-23
- Publication date:
- 2016-10-27
- Acceptance date:
- 2016-09-29
- DOI:
- EISSN:
-
1873-4081
- ISSN:
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1369-8001
Item Description
- Keywords:
- Pubs id:
-
pubs:719230
- UUID:
-
uuid:6a799a59-2799-4ab3-bcb8-3402d82ec459
- Local pid:
- pubs:719230
- Source identifiers:
-
719230
- Deposit date:
- 2017-10-13
Terms of use
- Copyright holder:
- Elsevier
- Copyright date:
- 2016
- Notes:
- © 2016 Elsevier Ltd. All rights reserved. This is the accepted manuscript version of the article. The final version is available online from Elsevier at: [10.1016/j.mssp.2016.09.041].
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