Journal article icon

Journal article

On the diffusion behaviour of Os in the binary Ni-Os system

Abstract:

The diffusion of Os in Ni is characterised by measuring interdiffusion coefficients in the binary Ni-Os system, in the temperature range 1200-1350°C. The results are compared with data for Ni-Re. Theoretical calculations indicate that Os should display a diffusion coefficient comparable with Re, among the lowest displayed by elements from the d-block transition elements. The authors' experimental findings confirm these predictions, and suggest that alloying with Os is likely to improve the hi...

Expand abstract
Publication status:
Published

Actions


Access Document


Authors


More by this author
Institution:
University of Oxford
Division:
MPLS
Department:
Materials
Role:
Author
Journal:
MATERIALS SCIENCE AND TECHNOLOGY More from this journal
Volume:
26
Issue:
10
Pages:
1173-1176
Publication date:
2010-10-01
DOI:
EISSN:
1743-2847
ISSN:
0267-0836
Language:
English
Keywords:
Pubs id:
pubs:369692
UUID:
uuid:69437447-2556-408b-88b8-c36fc0bd9bd0
Local pid:
pubs:369692
Source identifiers:
369692
Deposit date:
2013-11-16

Terms of use


Views and Downloads






If you are the owner of this record, you can report an update to it here: Report update to this record

TO TOP