- Abstract:
-
Diamond growth was carried out using various kinds of substrates and substrate holders in conventional microwave plasma-enhanced chemical vapor deposition with a mixture of CH4 and H2, and the quality and electrical properties of the diamond films were investigated. The surface morphology and properties of the films were sensitive to plasma reaction with surfaces other than the growing substrate, in addition to the plasma/substrate chemical reaction and the external parameters for diamond gro...
Expand abstract - Publication status:
- Published
- Publisher copy:
- 10.1016/S0040-6090(02)00006-8
-
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- Volume:
- 407
- Issue:
- 1-2
- Pages:
- 18-25
- Publication date:
- 2002-03-22
- DOI:
- ISSN:
-
0040-6090
- URN:
-
uuid:54d89912-a69c-4c36-98a6-689c46d773dd
- Source identifiers:
-
38207
- Local pid:
- pubs:38207
- Copyright date:
- 2002
Conference
Formation of diamond and nanocrystalline diamond films by microwave plasma CVD
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