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Formation of diamond and nanocrystalline diamond films by microwave plasma CVD

Abstract:

Diamond growth was carried out using various kinds of substrates and substrate holders in conventional microwave plasma-enhanced chemical vapor deposition with a mixture of CH4 and H2, and the quality and electrical properties of the diamond films were investigated. The surface morphology and properties of the films were sensitive to plasma reaction with surfaces other than the growing substrate, in addition to the plasma/substrate chemical reaction and the external parameters for diamond gro...

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Publication status:
Published

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Institution:
University of Oxford
Department:
Oxford, MPLS, Chemistry, Physical and Theoretical Chem
Role:
Author
Volume:
407
Issue:
1-2
Pages:
18-25
Publication date:
2002-03-22
DOI:
ISSN:
0040-6090
URN:
uuid:54d89912-a69c-4c36-98a6-689c46d773dd
Source identifiers:
38207
Local pid:
pubs:38207

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