- Abstract:
-
Optical lithography has been widely used in mass production of various electronic devices, mainly because of its high throughput capability. However, the resolution in conventional lithography is diffraction limited. Cost issues, on the other hand, make slower but higher resolution methods, like electron beam lithography, unattractive for industrial applications. In order to be able to continue the use of optical lithography, new schemes were developed that enhance the resolution. Phase-shift...
Expand abstract - Publication status:
- Published
- Publisher copy:
- 10.1109/ULTSYM.2002.1193394
-
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- Volume:
- 1
- Pages:
- 247-250
- Publication date:
- 2002-01-01
- DOI:
- ISSN:
-
1051-0117
- URN:
-
uuid:49052bb5-a4b2-4b50-b90b-16b03de902a4
- Source identifiers:
-
151486
- Local pid:
- pubs:151486
- ISBN:
- 0-7803-7582-3
- Copyright date:
- 2002
Conference
Near-field phase shift photolithography for high-frequency SAW transducers
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