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Near-field phase shift photolithography for high-frequency SAW transducers

Abstract:

Optical lithography has been widely used in mass production of various electronic devices, mainly because of its high throughput capability. However, the resolution in conventional lithography is diffraction limited. Cost issues, on the other hand, make slower but higher resolution methods, like electron beam lithography, unattractive for industrial applications. In order to be able to continue the use of optical lithography, new schemes were developed that enhance the resolution. Phase-shift...

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Publication status:
Published

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Publisher copy:
10.1109/ULTSYM.2002.1193394

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Institution:
University of Oxford
Division:
MPLS
Department:
Physics
Sub department:
Condensed Matter Physics
Role:
Author
Volume:
1
Pages:
247-250
Host title:
2002 IEEE ULTRASONICS SYMPOSIUM PROCEEDINGS, VOLS 1 AND 2
Publication date:
2002-01-01
DOI:
ISSN:
1051-0117
Source identifiers:
151486
ISBN:
0780375823
Pubs id:
pubs:151486
UUID:
uuid:49052bb5-a4b2-4b50-b90b-16b03de902a4
Local pid:
pubs:151486
Deposit date:
2012-12-19

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