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Substrate control for large area continuous films of monolayer MoS2 by atmospheric pressure chemical vapor deposition.

Abstract:

Growing monolayer MoS2 films that are continuous with large domain sizes by chemical vapor deposition is one of the major challenges in 2D materials research at the moment. Here, we explore how atmospheric pressure CVD can be used to grow centimeter scale continuous films of monolayer MoS2 films directly on Si substrates with an oxide layer whilst also obtaining large domain sizes exceeding 20 μm within the films. This is achieved by orientating the growth substrate in a vertical position to ...

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Publication status:
Published
Peer review status:
Peer reviewed
Version:
Accepted manuscript

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Publisher copy:
10.1088/0957-4484/27/8/085604

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Institution:
University of Oxford
Department:
Oxford, MPLS, Materials
Role:
Author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Materials
Role:
Author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Materials
Role:
Author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Materials
Role:
Author
More from this funder
Funding agency for:
Warner, JH
Publisher:
IOP Publishing Publisher's website
Journal:
Nanotechnology Journal website
Volume:
27
Issue:
8
Pages:
085604
Chapter number:
ARTN 085604
Publication date:
2016-01-28
Acceptance date:
2015-12-22
DOI:
EISSN:
1361-6528
ISSN:
0957-4484
URN:
uuid:465ed8fc-72e8-4095-9c90-936f372aa3ac
Source identifiers:
601354
Local pid:
pubs:601354
Paper number:
8

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