Journal article
Shape Evolution of Monolayer MoS2 Crystals Grown by Chemical Vapor Deposition
- Abstract:
-
Atmospheric-pressure chemical vapor deposition (CVD) is used to grow monolayer MoS2 two-dimensional crystals at elevated temperatures on silicon substrates with a 300 nm oxide layer. Our CVD reaction is hydrogen free, with the sulfur precursor placed in a furnace separate from the MoO3 precursor to individually control their heating profiles and provide greater flexibility in the growth recipe. We intentionally establish a sharp gradient of MoO3 precursor concentration on the growth substrate...
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- Publication status:
- Published
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Bibliographic Details
- Publisher:
- American Chemical Society
- Journal:
- CHEMISTRY OF MATERIALS
- Volume:
- 26
- Issue:
- 22
- Pages:
- 6371-6379
- Publication date:
- 2014-11-25
- DOI:
- EISSN:
-
1520-5002
- ISSN:
-
0897-4756
Item Description
- Language:
- English
- Pubs id:
-
pubs:492742
- UUID:
-
uuid:3f7e5032-385f-4bcb-b15a-8147775471b3
- Local pid:
- pubs:492742
- Source identifiers:
-
492742
- Deposit date:
- 2014-12-19
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- Copyright date:
- 2014
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