Characterisation of a saturated single frequency Ne-like Ge XUV laser on the J=0-&gt;1 transition at 19.6 nm

Zhang, J; Warwick, PJ; Wolfrum, E; Key, MH; Danson, C; Demir, A; Healy, S; Kalantar, D; Kim, NS; Lewis, CLS; Lin, J; MacPhee, A; Neely, D; Nilsen, J; Pert, GJ; Smith, R; Tallents, GJ; Wark, JS

Abstract:

We report on measurements of a saturated single frequency Ne-like Ge XUV laser on the J = 0->1 transition at 19.6 nm from a refraction compensating double target driven by 150 J of energy from 75 ps Nd-laser pulses. The 19.6 nm line completely dominated the laser output. The output energy was measured to be 0.9 mJ, corresponding to a conversion efficiency of 6x10(-6).

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APA Style

Zhang, J., Warwick, P. J., Wolfrum, E., Key, M. H., Danson, C., Demir, A., Healy, S., Kalantar, D., Kim, N. S., Lewis, C. L. S., Lin, J., MacPhee, A., Neely, D., Nilsen, J., Pert, G. J., Smith, R., Tallents, G. J., & Wark, J. S. (1996). Characterisation of a saturated single frequency Ne-like Ge XUV laser on the J=0->1 transition at 19.6 nm. 151, 56–58.

MLA Style

Zhang, J., et al. Characterisation of a Saturated Single Frequency Ne-like Ge XUV Laser on the J=0-1 Transition at 19.6 Nm. no. 151, 1996, pp. 56–58.

Chicago Style

Zhang, J, PJ Warwick, E Wolfrum, MH Key, C Danson, A Demir, S Healy, et al. 1996. “Characterisation of a Saturated Single Frequency Ne-like Ge XUV Laser on the J=0-1 Transition at 19.6 Nm.” In , 56–58.
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Zhang, J More by this author

Warwick, PJ More by this author

Wolfrum, E More by this author

Key, MH More by this author

Danson, C More by this author

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Bibliographic Details

Issue:: 151
Pages:: 56-58
Publication date:: 1996
ISSN:: 0951-3248
URN:: uuid:2ad4eae6-3e27-47ce-b070-e151cf1b4b26
Source identifiers:: 31128
Local pid:: pubs:31128
ISBN:: 0-7503-0406-5

Item Description

Keywords:: X-RAY LASER

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Characterisation of a saturated single frequency Ne-like Ge XUV laser on the J=0->1 transition at 19.6 nm

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