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Journal article

Oxygen and nitrogen transport in silicon investigated by dislocation locking experiments (vol 152, pg G460, 2005)

Publication status:
Published

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Publisher copy:
10.1149/1.1976462

Authors


Giannattasio, A More by this author
Murphy, JD More by this author
Senkader, S More by this author
Falster, RJ More by this author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Materials
Journal:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:
152
Issue:
8
Pages:
L12-L12
Publication date:
2005
DOI:
ISSN:
0013-4651
URN:
uuid:27d0834a-5eed-44bd-bd6f-1ae71ade4fb6
Source identifiers:
1777
Local pid:
pubs:1777
Language:
English

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