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THE MAGNETORESISTANCE OF SUBMICRON FE WIRES

Abstract:

A novel combination of electron- and ion-beam lithography has been used to prepare Fe gratings with wire widths of 0.5 μm and wire separations in the range 0.5-4 μm from an Fe/GaAs (001) film of thickness 25 nm. With an in-plane magnetic field applied perpendicular to the length of the wires, a harder magnetisation loop is observed using the magneto-optic Kerr effect (MOKE), compared with that observed in the unprocessed film. We observe a strong effect in the magnetoresistance (MR) when the ...

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Publication status:
Published

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Institution:
University of Oxford
Department:
Oxford, MPLS, Physics, Condensed Matter Physics
SHEARWOOD, C More by this author
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Journal:
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS
Volume:
135
Issue:
1
Pages:
L17-L22
Publication date:
1994-07-05
DOI:
ISSN:
0304-8853
URN:
uuid:216c0551-08ea-4008-957c-3fc2a52a401e
Source identifiers:
17302
Local pid:
pubs:17302

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