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Nanodiamond thin films on titanium substrates - Growth and electrochemical properties

Abstract:

A new type of electrically conducting nanosized diamond film deposit is grown on titanium substrates in a microwave plasma chemical vapor deposition process. The deposition process occurs at 80 Torr in a helium atmosphere with only hydrogen (1.95%) and methane (0.73%) admitted and yields a deposit growing approximately 0.5 μm h-1 thick. Electron microscopy indicates the formation of nanosized diamond platelets. The electrochemical properties of nanodiamond when immersed in aqueous electrolyte...

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Publication status:
Published

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Publisher copy:
10.1149/1.1528203

Authors


Grehan, KJ More by this author
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Chemistry, Physical and Theoretical Chem
More by this author
Institution:
University of Oxford
Department:
Oxford, MPLS, Chemistry, Physical and Theoretical Chem
Journal:
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:
150
Issue:
1
Pages:
E59-E65
Publication date:
2003-01-05
DOI:
ISSN:
0013-4651
URN:
uuid:204b91dd-550c-46c1-813b-4444b8a7c2a2
Source identifiers:
38555
Local pid:
pubs:38555
Language:
English

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